Specific Process Knowledge/Characterization/Probe station: Difference between revisions
No edit summary |
|||
| Line 2: | Line 2: | ||
[[Image:probe2.jpg|thumb|300x300px|Probe station. Positioned in serviceroom CX1]] | [[Image:probe2.jpg|thumb|300x300px|Probe station. Positioned in serviceroom CX1]] | ||
'''Feedback to this page''': '''[mailto:labadviser@ | '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Characterization/Probe_station click here]''' | ||
The Probe station is a - EPS150Triax - Cascade. The purpose is to measure I/V measurement, ohmic measurements etc. It has 4 individually adjustable triax connected probes, but can be fitted with additional coax connected probes. The stage can be moved in x and y to step and repeat a measurement over a large number of chips. | The Probe station is a - EPS150Triax - Cascade. The purpose is to measure I/V measurement, ohmic measurements etc. It has 4 individually adjustable triax connected probes, but can be fitted with additional coax connected probes. The stage can be moved in x and y to step and repeat a measurement over a large number of chips. | ||