Jump to content

Specific Process Knowledge/Etch/DRIE-Pegasus/picoscope: Difference between revisions

← Older editNewer edit →
VisualWikitext
Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,579 edits
Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,579 edits
Line 13: Line 13:
|-
|-
! Gas flow (sccm)  
! Gas flow (sccm)  
| SF<sub>6</sub> 350 (1.5 s) 550
| SF<sub>6</sub> 350 (1.5 s), 550
| C<sub>4</sub>F<sub>8</sub> 200
| C<sub>4</sub>F<sub>8</sub> 200
|-
|-
Line 21: Line 21:
|-
|-
! Pressure (mtorr)  
! Pressure (mtorr)  
| 25 (1.5 s) 150
| 25 (1.5 s), 150
| 25
| 25
|-
|-
Line 31: Line 31:
| 140 (1.5) 45
| 140 (1.5) 45
| 0  
| 0  
|-
! Cycles 
| colspan="2" | 44 (vary this)
|-
|-
! Common  
! Common  
| colspan="2" | Temperature 20 degs, HBC 10 torr, Short funnel, with baffle & 5mm spacers
| colspan="2" | Temperature 20 degs
|-
|-
|}
|}
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Etch/DRIE-Pegasus/picoscope"