|
|
| Line 248: |
Line 248: |
|
| |
|
| ==Comparison of the SEMs at DTU Nanolab - building 307/314 [[image:Under_construction.png|50px]]== | | ==Comparison of the SEMs at DTU Nanolab - building 307/314 [[image:Under_construction.png|50px]]== |
| {|border="1" cellspacing="1" cellpadding="3" style="text-align:left;" | | {{SEM comparison table 314}} |
| |-
| |
| | |
| |-
| |
| |-style="background:silver; color:black"
| |
| ! Equipment
| |
| <!-- ![[Specific Process Knowledge/Characterization/SEM Inspect S|SEM Inspect S]] -->
| |
| ![[Specific Process Knowledge/Characterization/SEM FEI Nova 600 NanoSEM|SEM FEI Nova 600 NanoSEM]]
| |
| ![[Specific Process Knowledge/Characterization/SEM FEI Quanta 200 ESEM FEG|SEM FEI QFEG 200 Cryo ESEM]]
| |
| <!-- ![[Specific Process Knowledge/Characterization/SEM FEI QUANTA 200 3D|FIB-SEM FEI QUANTA 200 3D]] -->
| |
| ![[Specific Process Knowledge/Characterization/Dual Beam FEI Helios Nanolab 600|Dual Beam FEI Helios Nanolab 600]]
| |
| |-
| |
| | |
| |-
| |
| |-style="background:WhiteSmoke; color:black"
| |
| !Purpose
| |
| <!-- |
| |
| *Conductive samples in High Vac
| |
| *Charge reduction in Low Vac
| |
| *X Ray Analysis with EDS and WDS -->
| |
| |
| |
| *Conductive samples in High Vac
| |
| *Charge reduction in Low Vac
| |
| *X Ray Analysis with EDS
| |
| *Crystallographic analysis using EBSD and both On and Off axis TKD
| |
| |
| |
| *Conductive samples in High Vac
| |
| *Charge reduction in Low Vac
| |
| *Environmental control using Peltier stage
| |
| *Cryogenic sample fixing/stabilization using cryo stage
| |
| *X Ray Analysis with EDS
| |
| <!-- |
| |
| *Conductive samples in High Vac
| |
| *Charge reduction in Low Vac
| |
| *Micro and Nano milling/fabrication using various gases and FIB -->
| |
| |
| |
| *Conductive samples in High Vac
| |
| *Micro and Nano milling/fabrication using various gases and FIB
| |
| *X Ray Analysis with EDS
| |
| *Crystallographic analysis using EBSD and Off Axis TKD
| |
| |-
| |
| | |
| |-
| |
| |-style="background:LightGrey; color:black"
| |
| !Equipment position
| |
| <!-- |CEN Building 314 -->
| |
| |CEN Building 314
| |
| |CEN Building 314
| |
| <!-- |CEN Building 307 Room 111 -->
| |
| |CEN Building 314
| |
| |-
| |
| | |
| |-
| |
| |style="background:LightGrey; color:black" rowspan="2" align="center" |Resolution
| |
| |style="background:Whitesmoke; color:black" colspan="5" align="center"| The resolution of a SEM is strongly dependent on sample type and the operator. Resolution quoted is using sputtered gold on carbon
| |
| |-
| |
| <!-- |
| |
| * High-vacuum
| |
| •3.0nm at 30kV (SE)
| |
| •10nm at 3kV (SE)
| |
| •4.0nm at 30kV (BSE)
| |
| * Low-vacuum
| |
| •3.0nm at 30kV (SE)
| |
| • 4.0nm at 30kV (BSE)
| |
| • > 12nm at 3kV (SE) -->
| |
| |B
| |
| |
| |
| * High vacuum
| |
| • 0.8 nm at 30 kV (STEM)
| |
| • 1.0 nm at 30 kV (SE)
| |
| • 2.5 nm at 30 kV (BSE) - 3.0 nm at 1 kV (SE)
| |
| *High vacuum with beam deceleration option
| |
| • 3.0 nm at 1 kV (BD mode + BSE)
| |
| | |
| * Low vacuum - 1.4 nm at 30 kV (SE)
| |
| •2.5 nm at 30 kV (BSE)
| |
| •3.0 nm at 3 kV (SE)
| |
| * Extended vacuum mode (ESEM)
| |
| •1.4 nm at 30 kV (SE)
| |
| <!-- |
| |
| * Electron Column
| |
| •5nm @30kV
| |
| * Ion Column
| |
| •7nm @ 30kV -->
| |
| |
| |
| * Electron Column
| |
| •0.8nm @15kV
| |
| •0.9nm @1kV
| |
| * Ion Column
| |
| •4.5nm @ 30kV
| |
| |-
| |
| |-
| |
| |-style="background:LightGrey; color:black"
| |
| !Detectors
| |
| <!-- |
| |
| *ETD Secondary Electrons
| |
| *BSED Back Scatter Electrons
| |
| *LVD/LFD Low Vac SE
| |
| *EDS X Ray by energy
| |
| *WDS X Ray by wavelength
| |
| *STEM Scanning Transmission Electron Microscopy -->
| |
| |
| |
| *ETD/TLD Secondary Electrons
| |
| *BSED Back Scatter Electrons
| |
| *LVD/LFD Low Vac SE
| |
| *Helix Low Vac SE
| |
| *EDS X Ray by energy
| |
| *EBSD Electron Back Scatter Diffraction
| |
| *TKD Transmission Kikuchi Diffraction
| |
| *STEM Scanning Transmission Electron Microscopy
| |
| *GAD Low Vac BSED
| |
| |
| |
| *ETD Secondary Electrons
| |
| *BSED Back Scatter Electrons
| |
| *LVD/LFD Low Vac SE
| |
| *GSED ESEM SE
| |
| *EDS X Ray by energy
| |
| *STEM Scanning Transmission Electron Microscopy
| |
| <!-- |
| |
| *ETD Secondary Electrons
| |
| *BSED Back Scatter Electrons
| |
| *LVD/LFD Low Vac SE
| |
| *STEM Scanning Transmission Electron Microscopy
| |
| *GAD Low VAC BSED
| |
| *GSED ESEM SE -->
| |
| |
| |
| *ETD/TLD Secondary Electrons
| |
| *ABS Annular BSED
| |
| *EDS X Ray by energy
| |
| *EBSD Electron Back Scatter Diffraction
| |
| *CDEM Continuos Dinode Electron Multiplier
| |
| |-
| |
| | |
| |-
| |
| |-style="background:WhiteSmoke; color:black"
| |
| !Stage specifications
| |
| <!-- |
| |
| * X 50mm
| |
| * Y 50mm
| |
| * Z 50mm
| |
| * R 360⁰
| |
| * T 70⁰ Manual -->
| |
| |
| |
| * X 150mm Piezo
| |
| * Y 150mm Piezo
| |
| * Z 10mm
| |
| * R 360⁰ Piezo
| |
| * T 70⁰
| |
| |
| |
| * X 50mm
| |
| * Y 50mm
| |
| * Z 50mm
| |
| * R 360⁰
| |
| * T 70⁰ Manual
| |
| <!-- |
| |
| * X 100mm
| |
| * Y 100mm
| |
| * Z 50mm
| |
| * R 360⁰
| |
| * T 70⁰ -->
| |
| |
| |
| * X 150mm Piezo
| |
| * Y 150mm Piezo
| |
| * Z 10mm
| |
| * R 360⁰ Piezo
| |
| * T 70⁰
| |
| |-
| |
| |-
| |
| |-style="background:LightGrey; color:black"
| |
| !Options
| |
| <!-- | A -->
| |
| | B
| |
| | C
| |
| <!-- | D -->
| |
| | E
| |
| |-
| |
| | |
| |-style="background:WhiteSmoke; color:black"
| |
| !Max sample size
| |
| |style="background:Whitesmoke; color:black" colspan="5" align="center"| Consult with DTU Nanolab staff as weight, dimensions, pumping capacity and technique all play a roll in the sample size
| |
| |}
| |
| | |
| <br clear="all" />
| |
