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Specific Process Knowledge/Lithography/DUVStepperLithography: Difference between revisions

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{| border="1" cellspacing="2" cellpadding="2" colspan="3"
{| border="1" cellspacing="2" cellpadding="2" colspan="3"
|bgcolor="#98FB98" |'''Quality Control (QC) for Spin Coater: Gamma e-beam & UV - AR-P 6200.09 [[Image:section under construction.jpg|70px]] '''
|bgcolor="#98FB98" |'''Quality Control (QC) for Spin coater: Süss Stepper - BARC DUV42S-6 [[Image:section under construction.jpg|70px]] '''
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*[http://labmanager.dtu.dk/d4Show.php?id=5123&mach=359 The QC procedure for Spin Coater: Gamma e-beam & UV]<br>
*[http://labmanager.dtu.dk/d4Show.php?id=5123&mach=359 The QC procedure for Spin coater: Süss Stepper]<br>
*[http://labmanager.dtu.dk/view_binary.php?fileId=4210 The newest QC data for Spin Coater: Gamma e-beam & UV]
*[http://labmanager.dtu.dk/view_binary.php?fileId=4212 The newest QC data for Spin coater: Süss Stepper]
{| {{table}}
{| {{table}}
| align="center" |  
| align="center" |  
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{| border="2" cellspacing="1" cellpadding="2" align="center" style="width:400px"
{| border="2" cellspacing="1" cellpadding="2" align="center" style="width:400px"
!QC limits
!QC limits
!Spin Coater: Gamma UV e-beam & UV - AR-P 6200.09
!Spin coater: Süss Stepper - BARC DUV42S-6
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|Nominal film thickness
|Nominal film thickness
|250 nm
|65 nm
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|Film thickness deviation from nominal
|Film thickness deviation from nominal
|<5%
|<15%
|-
|-
|Film thickness non-uniformity
|Film thickness non-uniformity