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Specific Process Knowledge/Lithography/Coaters/Spin Coater: Gamma UV processing: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,526 edits
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,526 edits
Line 56: Line 56:
! QC Recipe:
! QC Recipe:
! (2421) DCH 100mm nLOF 2020 2um HMDS  
! (2421) DCH 100mm nLOF 2020 2um HMDS  
|-
|Substrate size
|4"
|-  
|-  
| Resist volume
| Resist volume
Line 78: Line 81:
!QC limits
!QC limits
!Spin Coater: Gamma UV - AZ nLOF 2020
!Spin Coater: Gamma UV - AZ nLOF 2020
|-
|Nominal film thickness
|2.0 µm
|-
|-
|Film thickness deviation from nominal
|Film thickness deviation from nominal
Line 105: Line 111:
! QC Recipe:
! QC Recipe:
! (3411) DCH 100mm 5214E 1.5um HMDS  
! (3411) DCH 100mm 5214E 1.5um HMDS  
|-
|Substrate size
|4"
|-  
|-  
| Resist volume
| Resist volume
Line 127: Line 136:
!QC limits
!QC limits
!Spin Coater: Gamma UV - AZ 5214E
!Spin Coater: Gamma UV - AZ 5214E
|-
|Nominal film thickness
|1.5 µm
|-
|-
|Film thickness deviation from nominal
|Film thickness deviation from nominal
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