Specific Process Knowledge/Lithography/Coaters/Spin Coater: Gamma UV processing: Difference between revisions
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''Sequence names, process parameters, and test results (Sequence no. 2000-2999):'' | ''Sequence names, process parameters, and test results (Sequence no. 2000-2999):'' | ||
*'''(2410) DCH 100mm nLOF 2020 1.5um''' | *'''(2410) DCH 100mm nLOF 2020 1.5um''' | ||
*'''(2411) DCH 100mm nLOF 2020 1.5um HMDS''' | *'''(2411) DCH 100mm nLOF 2020 1.5um HMDS''' see also [[Specific_Process_Knowledge/Lithography/Coaters/Spin_Coater:_Gamma_UV_processing#Quality_Control_.28QC.29|QC]] | ||
*'''(2610) DCH 150mm nLOF 2020 1.5um''' | *'''(2610) DCH 150mm nLOF 2020 1.5um''' | ||
*'''(2611) DCH 150mm nLOF 2020 1.5um HMDS''' | *'''(2611) DCH 150mm nLOF 2020 1.5um HMDS''' | ||
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|4" wafer, with HMDS. 9 points on one wafer, exclusion zone 5mm | |4" wafer, with HMDS. 9 points on one wafer, exclusion zone 5mm | ||
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==AZ 5214E coating== | ==AZ 5214E coating== | ||