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==Boron-doped amorphous silicon by using 4" LPCVD polysilicon furnace (B4) ==
==Boron-doped amorphous silicon by using 4" LPCVD polysilicon furnace (B4) ==
''Result from Thomas Pedersen, @Nanotech, September 2015''
''Result from Thomas Pedersen, DTU Nanotech (now DTU Nanolab), September 2015''
====Process parameters====
====Process parameters====


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