Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 03 processing: Difference between revisions
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=Features= | =Features= | ||
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The standard range for the defocus parameter is -10 to 10, but a special feature allows to extend this range to -25 to 25, which may be useful when exposing thick resist. The large defocus range feature is activated in the resist template, and can only be accessed by asking staff to set up a custom resist template. | The standard range for the defocus parameter is -10 to 10, but a special feature allows to extend this range to -25 to 25, which may be useful when exposing thick resist. The large defocus range feature is activated in the resist template, and can only be accessed by asking staff to set up a custom resist template. | ||
=Alignment= | =Alignment= | ||