Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 03 processing: Difference between revisions
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As expected from Aligner Maskless 01 and 02, the accuracy of flat alignment is ±0.1°, and the substrate centering is within a couple of hundred µm. | As expected from Aligner Maskless 01 and 02, the accuracy of flat alignment is ±0.1°, and the substrate centering is within a couple of hundred µm. | ||
==Large defocus range== | ==Large defocus range== | ||