Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 03 processing: Difference between revisions
| Line 213: | Line 213: | ||
The standard range for the defocus parameter is -10 to 10, but a special feature allows to extend this range to -25 to 25, which may be useful when exposing thick resist. The large defocus range feature is activated in the resist template, and can only be accessed by asking staff to set up a custom resist template. | The standard range for the defocus parameter is -10 to 10, but a special feature allows to extend this range to -25 to 25, which may be useful when exposing thick resist. The large defocus range feature is activated in the resist template, and can only be accessed by asking staff to set up a custom resist template. | ||
=Alignment= | =Alignment= | ||