Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 03 processing: Difference between revisions
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|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
| | |Jehem Feb 2020 | ||
| 3.6 mRad | | 3.6 mRad | ||
| ±1.4 mRad | | ±1.4 mRad | ||