Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 03 processing: Difference between revisions

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 =Features=
+==Substrate centring and flat alignment==
+During substrate detection, the sample is scanned along the X- and Y-axes, as well as diagonally. From these measurements, the size (diameter) of the substrate is calculated, as well as the stage position matching the center of the substrate. This stage position will be the default origin for the subsequent exposure.
+At the end of substrate detection, the sample is scanned twice along the bottom edge (flat), in order to determine the substrate rotation. This angle will be presented in the exposure panel along with the option to expose the design rotated in order to compensate for this angle, i.e. aligned to the flat/edge of the substrate.
+'''Result of using "Expose with substrate angle" (Jehem Feb 2020):'''
+*Rotation: 0.05±0.2°
+*Centring:
+** '''X''' 125±50µm
+** '''Y''' 104±50µm
+'''Result of loading the same substrate 10 times without removing it from the stage:'''
+{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"
+|-
+|-
+|-style="background:silver; color:black"
+!
+! Average
+! Range
+|-
+|-
+|-style="background:WhiteSmoke; color:black"
+|Pneumatic autofocus
+(Jehem Feb 2020)
+| 3.6 mRad
+| ±1.4 mRad
+±0.08°
+|}
+<br clear="all" />
 =Alignment=