Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
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|Trilayer stack: [[media:Process_Flow_Trilayer_Ebeam_Resist.docx|Process_Flow_Trilayer_Ebeam_Resist.docx]] | |Trilayer stack: [[media:Process_Flow_Trilayer_Ebeam_Resist.docx|Process_Flow_Trilayer_Ebeam_Resist.docx]] | ||
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|'''AR-N 7500.18''' | |||
|Negative | |||
|[http://www.allresist.com AllResist] | |||
|Both e-beam, DUV and UV-sensitive resist. Currently being tested, contact [mailto:thope@dtu.dk Thomas Pedersen] for information. | |||
|[[media:ARN7500.pdf|ARN7500.pdf]] | |||
|See table <u>[[Specific_Process_Knowledge/Lithography/Coaters#Coaters:_Comparison_Table|here]] </u> | |||
|PGMEA | |||
|MIF726 | |||
|H2O | |||
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