Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions

Revision as of 12:24, 13 March 2020 view source Taran (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891 3,528 edits →Substrate centring and flat alignment ← Older edit		Revision as of 12:31, 13 March 2020 view source Taran (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891 3,528 edits →Writing speed Newer edit →
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	[[Image:MLA150_speedVSarea.JPG\|400x400px\|thumb\|The writing speed of Aligner: Maskless 02 (fast mode, 375nm) as a function of the exposure area]]		[[Image:MLA150_speedVSarea.JPG\|400x400px\|thumb\|The writing speed of Aligner: Maskless 02 (fast mode, 375nm) as a function of the exposure area]]


	'''Speed vs. area:'''		'''Speed vs. area:'''