Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 03 processing: Difference between revisions

@@ Line 105: / Line 105: @@
 ==Acceptance test==
-Acceptance criteria on a 100 X 100 mm<sup>2</sup> area: Width of smallest resolved line 1000±100 nm (quality), alignment error 500 nm (quality), writing speed 1100 mm<sup>2</sup>/min (fast).
+Acceptance criteria on a 100 X 100 mm<sup>2</sup> area: Width of smallest resolved line 1000±120 nm (quality), alignment error 500 nm (quality), writing speed 1100 mm<sup>2</sup>/min (fast).
 The acceptance test also included a verification of back side alignment (better than 1 µm), as well as a test of the conversion speed (less than 15 minutes for a dense design of circles).
@@ Line 116: / Line 116: @@
 |-
 |-style="background:silver; color:black"
-!colspan="2"|SAT Feb 2019
+!colspan="2"|
 !Width of smallest resolved line [nm]
 !Alignment error (TSA) [nm]
@@ Line 124: / Line 124: @@
 |-
 |-style="background:WhiteSmoke; color:black"
-|rowspan="2"|405 nm
+|rowspan="2"|FAT December 2019
 |'''X'''
-| 532±64
+| 985±72
-| 251
+| 427
-|rowspan="2" align="mid"| 333
+|rowspan="2" align="mid"| 1269
 |-
 |-style="background:WhiteSmoke; color:black"
 |'''Y'''
-| 599±58
+| 953±47
-| 382
+| 362
 |-
 |-style="background:WhiteSmoke; color:black"
-|rowspan="2"|375 nm
+|SAT February 2020
-|'''X'''
+|
-| 556±44
+| ≤1000
-| 214
+| ≤500
-|rowspan="2" align="mid"| 347
+| align="mid"| 1212
-|-
-|-style="background:WhiteSmoke; color:black"
-|'''Y'''
-| 579±63
-| 224
 |}