Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 03 processing: Difference between revisions
| Line 39: | Line 39: | ||
|rowspan="2"| 1.5 µm | |rowspan="2"| 1.5 µm | ||
| Fast | | Fast | ||
| | | 69-72 mJ/cm<sup>2</sup> | ||
| | | 0 | ||
| | | 2 µm (due to stitching) | ||
| Dev: SP60s | | Dev: SP60s | ||
|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
| Quality | | Quality | ||
| | | 69 mJ/cm<sup>2</sup> | ||
| | | 0 | ||
| | | 1.25 | ||
| Dev: SP60s | | Dev: SP60s | ||
|- | |- | ||
| Line 56: | Line 56: | ||
|rowspan="2"| 1.5 µm | |rowspan="2"| 1.5 µm | ||
| Fast | | Fast | ||
| | | NA mJ/cm<sup>2</sup> | ||
| | | 0 | ||
| | | NA µm | ||
| PEB: 60s@110°C, Dev: SP60s | | PEB: 60s@110°C, Dev: SP60s | ||
|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
| Quality | | Quality | ||
| | | 200-220 mJ/cm<sup>2</sup> | ||
| | | 0-1 | ||
| | | 1 µm | ||
| PEB: 60s@110°C, Dev: SP60s | | PEB: 60s@110°C, Dev: SP60s | ||
|- | |- | ||
| Line 73: | Line 73: | ||
|rowspan="2"| 2.2 µm | |rowspan="2"| 2.2 µm | ||
| Fast | | Fast | ||
| | | 43 mJ/cm<sup>2</sup> | ||
| | | 0 | ||
| | | >2 µm (a lot of stitching) | ||
| Reversal bake: 120s@110°C, Flood exposure: 200mJ/cm<sup>2</sup>, Dev: SP60s | | Reversal bake: 120s@110°C, Flood exposure: 200mJ/cm<sup>2</sup>, Dev: SP60s | ||
|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
| Quality | | Quality | ||
| | | 43 mJ/cm<sup>2</sup> | ||
| | | 0 | ||
| | | 2 µm (due to stitching) | ||
| Reversal bake: 120s@110°C, Flood exposure: 200mJ/cm<sup>2</sup>, Dev: SP60s | | Reversal bake: 120s@110°C, Flood exposure: 200mJ/cm<sup>2</sup>, Dev: SP60s | ||
|- | |- | ||