Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 03 processing: Difference between revisions
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The acceptance test also included a verification of back side alignment (better than 1 µm), as well as a test of the conversion speed (less than 15 minutes for a dense design of circles). | The acceptance test also included a verification of back side alignment (better than 1 µm), as well as a test of the conversion speed (less than 15 minutes for a dense design of circles). | ||
'''Exposed on mask blank, transferred via wet chrome etch, and measured at Heidelberg (FAT)''' | '''Exposed on mask blank, transferred via wet chrome etch, and measured at Heidelberg (FAT), or exposed and inspected at DTU (SAT)''' | ||
{|border="1" cellspacing="0" cellpadding="3" style="text-align:center;" | {|border="1" cellspacing="0" cellpadding="3" style="text-align:center;" | ||