Specific Process Knowledge/Etch/DryEtchProcessing/Comparison: Difference between revisions
| Line 240: | Line 240: | ||
| style="background:lightgrey; color:black" | | | style="background:lightgrey; color:black" | | ||
| style="background:lightgrey; color:black" | | | style="background:lightgrey; color:black" | | ||
* Silicon | * Silicon, Silicon oxide, silicon nitride | ||
* Fused silica | * Fused silica | ||
* Sapphire | * Sapphire | ||
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*<5% metal on the suface (for 4") | *<5% metal on the suface (for 4") | ||
| style="background:lightgrey; color:black" | | | style="background:lightgrey; color:black" | | ||
* Silicon | * Silicon, Silicon oxide, silicon nitride | ||
* Fused silica | * Fused silica | ||
* Sapphire | * Sapphire | ||
| Line 255: | Line 255: | ||
* Al,(Cr) as masking materials | * Al,(Cr) as masking materials | ||
| style="background:lightgrey; color:black" colspan="4"| | | style="background:lightgrey; color:black" colspan="4"| | ||
* Silicon | * Silicon, Silicon oxide, silicon nitride | ||
* Fused silica | * Fused silica | ||
* Sapphire | * Sapphire | ||
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* Resists | * Resists | ||
| style="background:lightgrey; color:black" | | | style="background:lightgrey; color:black" | | ||
* Silicon | * Silicon, Silicon oxide, silicon nitride | ||
* Fused silica | * Fused silica | ||
* Sapphire | * Sapphire | ||
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* Resists | * Resists | ||
| style="background:lightgrey; color:black" | | | style="background:lightgrey; color:black" | | ||
* Silicon | * Silicon, Silicon oxide, silicon nitride | ||
* Fused silica | * Fused silica | ||
* Sapphire | * Sapphire | ||
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* Resists (at low temperature processing) | * Resists (at low temperature processing) | ||
| style="background:lightgrey; color:black" | | | style="background:lightgrey; color:black" | | ||
* Silicon | * Silicon, Silicon oxide, silicon nitride | ||
* Aluminium | * Aluminium | ||
* Fused silica | * Fused silica | ||