Specific Process Knowledge/Thermal Process/Oxidation: Difference between revisions
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[[Specific_Process_Knowledge/Thermal_Process/C3_Anneal-bond_furnace|Anneal Bond furnace (C3)]] | [[Specific_Process_Knowledge/Thermal_Process/C3_Anneal-bond_furnace|Anneal Bond furnace (C3)]] | ||
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[[Specific_Process_Knowledge/Thermal_Process/Furnace_Noble|Multipurpose Annealing furnace]] | [[Specific_Process_Knowledge/Thermal_Process/Furnace_Noble|Multipurpose Annealing furnace]] | ||
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|Dry and wet oxidation of 100 mm and 150 mm wafers. Oxidation of new wafers without RCA cleaning. Oxidation and annealing of wafers from the LPCVD furnaces and PECVD4. | |Dry and wet oxidation of 100 mm and 150 mm wafers. Oxidation of new wafers without RCA cleaning. Oxidation and annealing of wafers from the LPCVD furnaces and PECVD4. | ||
|Dry and wet oxidation and annealing of wafers from Wafer Bonder 02 and from PECVD4 and PECVD3. | |Dry and wet oxidation and annealing of wafers from Wafer Bonder 02 and from PECVD4 and PECVD3. | ||
|Dry oxidation and annealing of almost all materials. | |Dry oxidation and annealing of almost all materials. | ||
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*Dry: O<sub>2</sub> | *Dry: O<sub>2</sub> | ||
*Wet: Bubbler | *Wet: Bubbler | ||
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|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
!Annealing gas | !Annealing gas | ||
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*N<sub>2</sub> | *N<sub>2</sub> | ||
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*900 <sup>o</sup>C - 1150 <sup>o</sup>C | *900 <sup>o</sup>C - 1150 <sup>o</sup>C | ||
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*Vacuum: 20 <sup>o</sup>C - 1050 <sup>o</sup>C | *Vacuum: 20 <sup>o</sup>C - 1050 <sup>o</sup>C | ||
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*1-30 50 mm wafers | *1-30 50 mm wafers | ||
*1-30 100 mm wafers | *1-30 100 mm wafers | ||
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*1-30 50 mm, 100 mm or 150 mm wafers | *1-30 50 mm, 100 mm or 150 mm wafers | ||
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*All processed wafers have to be RCA cleaned, except for wafers from Wafer Bonder 02 and from PECVD4 and PECVD3. | *All processed wafers have to be RCA cleaned, except for wafers from Wafer Bonder 02 and from PECVD4 and PECVD3. | ||
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*Depends on the furnace quartz set: | *Depends on the furnace quartz set: | ||