Specific Process Knowledge/Thermal Process/Oxidation: Difference between revisions

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	*Dry oxidation is used to grow 5 nm - 300 nm of oxide in the furnaces: A1, A2, A3, C1, C3, C4, Multipurpose Anneal ~~and Noble~~.		*Dry oxidation is used to grow 5 nm - 300 nm of oxide in the furnaces: A1, A2, A3, C1, C3, C4 and Multipurpose Anneal.
	*Wet oxidation is used to grow up to 3 µm of oxide in the furnaces: A1, A3, C1 and C3.		*Wet oxidation is used to grow up to 3 µm of oxide in the furnaces: A1, A3, C1 and C3.