Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-2: Difference between revisions
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[[Category: Equipment |Etch DRIE]] | [[Category: Equipment |Etch DRIE]] | ||
[[Category: Etch (Dry) Equipment|DRIE]] | [[Category: Etch (Dry) Equipment|DRIE]] | ||
===This system is a research tool and not available to the users=== | |||
If you want to get access to the tool, then take to professor Henry Jansen | |||
*[[/Si Nano etching|Nanoscale silicon etching with SF6 and O2]] | *[[/Si Nano etching|Nanoscale silicon etching with SF6 and O2]] | ||
Revision as of 10:52, 21 February 2020
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This system is a research tool and not available to the users
If you want to get access to the tool, then take to professor Henry Jansen