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| Line 9: |
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| The etch gas and catalyst easily diffuses into "hidden spaces" making e.g. long undercuts, membrane and resonator release etches feasible. | | The etch gas and catalyst easily diffuses into "hidden spaces" making e.g. long undercuts, membrane and resonator release etches feasible. |
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| = Preliminary steps =
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| == Layout preparation ==
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| You need to import your layout in Elphy before patterning your sample. The software contains a proprietary layout editor in which you can import, view and edit your designs afterwards.
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| The editor reads and produces single .gds or .csf files. To design your pattern you can use L-edit, Clewin or other CAD software. Try to limit yourself to a simple pattern for your first training, such as parallel lines or arrays of dots/squares, with variable size and pitch.
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| Access the software by using the username and password provided during your first training. As mentioned before, you can do this at any time, with or without operating also to the SEM LEO (just ignore the error). Go to ''Design'' ([[File:Under_construction.png|30px]]) and ''Open'' your already prepared layout or click on ''New'' and use the GDS editor to design a new one.
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| Some useful information:
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| *If you have a layout with significantly different feature sizes, place finer structures on a different layer than the bigger ones, in order to be able to pattern them with different doses.
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| *Do not use layer 61, 62 and 63 for your features. These are connected to special functions inside Elphy.
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| *Elphy's editor saves additional information such as dose modulation. During the import/export procedures some of them may be lost or modified. Always double check your layout after importing it.
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| == Systems setup ==
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| When you are ready to pattern, log on the LEO SEM computer on LabManager and start the imaging software '''SmartSEM UIF''' as usual, and then start '''Remcon32''', which can be found on the microscope's PC desktop as well. Select ''COM 6'' from the dropdown menu, then right click and ''Open Port''.<br>
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| Move to the Raith pc and start '''ELPHY Quantum''' with your username and password (you will be assigned one during your first training).<br>
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| If you did everything right, multiple lines of code will appear in the Remcon32 terminal and Elphy will start without prompting any error.
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| == Mounting of chips or wafers into chamber ==
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| [[File:Under_construction.png|thumb|200x200px|Two chips mounted on the Raith holder]]
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| Mount samples in the dedicated Raith holder as shown in the picture, using the 3 clips available. Ensure that your sample is properly leveled, tightly kept in place by the clips, and is not obstructing the Faraday cup aperture. If the sample is insulating, you can use some conductive tape around exposure area to reduce charging.
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| Vent and open the SEM chamber, insert the holder on the LEO stage dovetail, close the chamber and pump down as usual.
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| = Basic exposure = | | = Basic exposure = |
