Jump to content

Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 03 processing: Difference between revisions

← Older editNewer edit →
VisualWikitext
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,528 edits
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,528 edits
Line 19: Line 19:


'''Quality''' mode is used for optimal resolution and minimum stripe stitching effects.
'''Quality''' mode is used for optimal resolution and minimum stripe stitching effects.
In the high quality mode, an area of the pattern is exposed by 5 stripes, each 500µm wide and exposing a fifth of the dose. At the same time, sub-pixel interpolation is applied, yielding an address grid size of 100nm.
In the high quality mode, an area of the pattern is exposed by 5 stripes, each 500µm wide and exposing a fifth of the dose. At the same time, sub-pixel interpolation is applied, yielding an address grid size of 100nm.


'''Fast''' mode is used for maximum exposure speed.
'''Fast''' mode is used for maximum exposure speed.
In the fast mode, each area of the pattern is exposed by 2 stripes only. This effectively cuts the exposure time in half, but also increases the size of the address grid in the X-direction to 250nm. Due to less averaging of non-uniformities, stitching effects will be more prominent in this mode.
 
In the fast mode, each area of the pattern is exposed by 2 stripes only. This effectively cuts the exposure time in half, but also increases the size of the address grid in the X-direction to 250nm. This means that alignment will be less accurate in fast mode. Due to less averaging of non-uniformities, stitching effects will be more prominent in this mode.
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography/Aligners/Aligner:_Maskless_03_processing"