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Specific Process Knowledge/Thin film deposition/ALD2 (PEALD): Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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Pevo (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
2,370 edits
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|style="background:LightGrey; color:black"|Deposition temperature
|style="background:LightGrey; color:black"|Deposition temperature
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
Maximum 450 <sup>o</sup>C  
Maximum 500 <sup>o</sup>C  
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|style="background:LightGrey; color:black"|Thermal precursors
|style="background:LightGrey; color:black"|Thermal precursors
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