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Specific Process Knowledge/Lithography/Pretreatment: Difference between revisions

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Elkh (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
343 edits
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=Buffered HF-Clean=
=Buffered HF-Clean=
'''Feedback to this section''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Pretreatment#Buffered_HF-Clean click here]'''
'''Feedback to this section''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Pretreatment#Buffered_HF-Clean click here]'''
[[Image:BHF_RR3.jpg|300x300px|thumb|Buffered HF-Clean in C-1]]
[[]]|300x300px|thumb|


Another commonly used method to render the surface of silicon wafers hydrophobic is the dilute HF dip.
Another commonly used method to render the surface of silicon wafers hydrophobic is the dilute HF dip.
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