|
|
| Line 213: |
Line 213: |
|
| |
|
| <br clear="all" /> | | <br clear="all" /> |
|
| |
| ==HMDS oven==
| |
|
| |
| [[Image:HMDS1.JPG|300x300px|thumb|The HMDS oven is placed in Cleanroom C-1.]]
| |
|
| |
| At DTU Nanolab we use Star2000 model from IMTEC to do vapor deposition of hexamethyldisilizane (HMDS) under the special conditions: low pressure and high chamber temperature. The result of the dehydration bake and HMDS prime is that the wafers become hydrophobic after the treatment.
| |
|
| |
| '''The user manual, user APV, and contact information can be found in LabManager:'''
| |
|
| |
| [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=54 HMDS oven in LabManager]
| |
|
| |
| ===Process information===
| |
|
| |
| *Recipe 4: baseline prime process with 5 min priming time
| |
|
| |
|
| |
| '''Baseline prime process description:'''
| |
|
| |
| 1. Pump-down, 2 min
| |
|
| |
| 2. Nitrogen purge, 3.5 min
| |
|
| |
| 3. Heat-up, 10 min
| |
|
| |
| 4. Pump-down to 3 mBar
| |
|
| |
| 5. HMDS prime, 5 min
| |
|
| |
| 6. Chamber exhaust, 3 min
| |
|
| |
| 7. Nitrogen purge, 3.5 min
| |
|
| |
|
| ==Oven: HMDS 2== | | ==Oven: HMDS 2== |
