Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
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When spin coating e-beam resist, you should use a pipette to transfer resist from your bottle to the substrate. If you pour the resist directly from your bottle, you will leave resist in the thread that will soon dry out and leave particles in the resist. | When spin coating e-beam resist, you should use a pipette to transfer resist from your bottle to the substrate. If you pour the resist directly from your bottle, you will leave resist in the thread that will soon dry out and leave particles in the resist. | ||
The disposable pipettes need to be thoroughly cleaned with a N2 gun before use (app. 20 s). After some | The disposable pipettes need to be thoroughly cleaned with a N2 gun before use (app. 20 s). After some practice, you can obtain particle-free 4" wafers if bottle and pipette (and spin coater) are properly cleaned. | ||
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Keep your resist bottles in up-right position, do not tilt or shake them too much, this can spread particles from the sidewall into the resist. | Keep your resist bottles in up-right position, do not tilt or shake them too much, this can spread particles from the sidewall into the resist. | ||