Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/ProcessD/NewProcessD: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,416 edits
No edit summary
Line 23: Line 23:
| Pegasus/jmli
| Pegasus/jmli
| 20 minute TDESC clean
| 20 minute TDESC clean
| danchip/jml/showerhead/prD/New Process D, 75 cycles or 5:00 minutes  
| nanolab/jml/showerhead/prD/New Process D, 75 cycles or 5:00 minutes  
| S004743
| S004743
! New showerhead  
! New showerhead  

Revision as of 21:25, 25 November 2019

Process runs
Date Substrate Information Process Information SEM Images
Wafer info Mask Material/ Exposed area Tool / Operator Conditioning Recipe Wafer ID Comments
15/12-2014 4" Wafer with AZ resist Travka50 pattern Si / 50 % Pegasus/jmli 20 minute TDESC clean nanolab/jml/showerhead/prD/New Process D, 75 cycles or 5:00 minutes S004743 New showerhead

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