Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/ProcessA: Difference between revisions

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Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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Line 19: Line 19:
|-
|-
| 18/8-2014
| 18/8-2014
| 4" Danchip QC Wafer  
| 4" Nanolab QC Wafer  
| 1.5 µm AZ resist, daq2 mask
| 1.5 µm AZ resist, daq2 mask
| Si / 10 %  
| Si / 10 %  
| Pegasus/jmli
| Pegasus/jmli
| 10 minute TDESC clean, 10 minute PR strip post process
| 10 minute TDESC clean, 10 minute PR strip post process
| danchip/QC/QCprocA, 55 cycles (11+44) or 10:05 minutes  
| nanolab/QC/QCprocA, 55 cycles (11+44) or 10:05 minutes  
| S004257
| S004257
! OLD showerhead  
! OLD showerhead  
Line 37: Line 37:
|-
|-
| 20/11-2014
| 20/11-2014
| 4" Danchip QC Wafer  
| 4" Nanolab QC Wafer  
| 1.5 µm AZ resist, daq2 mask
| 1.5 µm AZ resist, daq2 mask
| Si / 10 %  
| Si / 10 %  
| Pegasus/jmli
| Pegasus/jmli
| 10 minute TDESC clean, 10 minute PR strip post process
| 10 minute TDESC clean, 10 minute PR strip post process
| danchip/QC/QCprocA, 55 cycles (11+44) or 10:05 minutes  
| Nanolab/QC/QCprocA, 55 cycles (11+44) or 10:05 minutes  
| S004580
| S004580
! OLD showerhead  
! OLD showerhead  
Line 52: Line 52:
|-
|-
| 1/12-2014
| 1/12-2014
| 4" Danchip QC Wafer  
| 4" Nanolab QC Wafer  
| 1.5 µm AZ resist, daq2 mask
| 1.5 µm AZ resist, daq2 mask
| Si / 10 %  
| Si / 10 %  
| Pegasus/jmli
| Pegasus/jmli
| 10 minute TDESC clean, 10 minute PR strip post process
| 10 minute TDESC clean, 10 minute PR strip post process
| danchip/QC/QCprocA, 55 cycles (11+44) or 10:05 minutes  
| Nanolab/QC/QCprocA, 55 cycles (11+44) or 10:05 minutes  
| S004671
| S004671
! New showerhead  
! New showerhead  
Line 68: Line 68:
|-
|-
| 15/12-2014
| 15/12-2014
| 4" Danchip QC Wafer  
| 4" Nanolab QC Wafer  
| 1.5 µm AZ resist, daq2 mask
| 1.5 µm AZ resist, daq2 mask
| Si / 10 %  
| Si / 10 %  
| Pegasus/jmli
| Pegasus/jmli
| 10 minute TDESC clean, 10 minute PR strip post process
| 10 minute TDESC clean, 10 minute PR strip post process
| danchip/QC/QCprocA, 55 cycles (11+44) or 10:05 minutes  
| Nanolab/QC/QCprocA, 55 cycles (11+44) or 10:05 minutes  
| S004746
| S004746
! New showerhead  
! New showerhead  

Revision as of 21:20, 25 November 2019


Process runs
Date Substrate Information Process Information SEM Images
Wafer info Mask Material/ Exposed area Tool / Operator Conditioning Recipe Wafer ID Comments
18/8-2014 4" Nanolab QC Wafer 1.5 µm AZ resist, daq2 mask Si / 10 % Pegasus/jmli 10 minute TDESC clean, 10 minute PR strip post process nanolab/QC/QCprocA, 55 cycles (11+44) or 10:05 minutes S004257 OLD showerhead

20/11-2014 4" Nanolab QC Wafer 1.5 µm AZ resist, daq2 mask Si / 10 % Pegasus/jmli 10 minute TDESC clean, 10 minute PR strip post process Nanolab/QC/QCprocA, 55 cycles (11+44) or 10:05 minutes S004580 OLD showerhead

1/12-2014 4" Nanolab QC Wafer 1.5 µm AZ resist, daq2 mask Si / 10 % Pegasus/jmli 10 minute TDESC clean, 10 minute PR strip post process Nanolab/QC/QCprocA, 55 cycles (11+44) or 10:05 minutes S004671 New showerhead

15/12-2014 4" Nanolab QC Wafer 1.5 µm AZ resist, daq2 mask Si / 10 % Pegasus/jmli 10 minute TDESC clean, 10 minute PR strip post process Nanolab/QC/QCprocA, 55 cycles (11+44) or 10:05 minutes S004746 New showerhead

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