Jump to content

Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/ProcessD/original: Difference between revisions

← Older editNewer edit →
VisualWikitext
Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,565 edits
No edit summary
Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,565 edits
No edit summary
Line 23: Line 23:
| Pegasus/jmli
| Pegasus/jmli
| 10 minute TDESC clean
| 10 minute TDESC clean
| danchip/jml/showerhead/prD, 110 cycles or 8:04 minutes  
| nanolab/jml/showerhead/prD, 110 cycles or 8:04 minutes  
| S004584
| S004584
! Old showerhead  
! Old showerhead  
Line 37: Line 37:
| Pegasus/jmli
| Pegasus/jmli
| 10 minute TDESC clean + 45 sec barc etch
| 10 minute TDESC clean + 45 sec barc etch
| danchip/jml/showerhead/polySi etch DUV mask, 20 cycles or 3:02 minutes  
| nanolab/jml/showerhead/polySi etch DUV mask, 20 cycles or 3:02 minutes  
| S004675
| S004675
! New showerhead  
! New showerhead  
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Etch/DRIE-Pegasus/showerheadchange/ProcessD/original"