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Specific Process Knowledge/Etch/ICP Metal Etcher/silicon nitride: Difference between revisions

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Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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!Results  
!Results  
!Test on wafer with 20% load, ''by Izzet Yildiz @Nanotech''
!Test on wafer with 20% load, ''by Izzet Yildiz @Nanotech''
!Test by BGHE @danchip
!Test by BGHE @nanolab
|-
|-
|Etch rate of LPCVD nitride
|Etch rate of LPCVD nitride
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Etch/ICP_Metal_Etcher/silicon_nitride"