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Specific Process Knowledge/Etch/ICP Metal Etcher/silicon oxide: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,580 edits
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|-style="background:Black; color:White"
|-style="background:Black; color:White"
!Results  
!Results  
!Test on 6" wafer, by Peixiong Shi@danchip
!Test on 6" wafer, by Peixiong Shi@nanolab
|-
|-
|Etch rate of thermal oxide
|Etch rate of thermal oxide
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Etch/ICP_Metal_Etcher/silicon_oxide"