Specific Process Knowledge/Lithography/CSAR: Difference between revisions

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	Simple e-beam pattern in this resist has been tested, the results showed on this page. If you have questions to the process or wish to use this e-beam resist, please contact [mailto:lithography@~~danchip~~.dtu.dk lithography] at DTU Danchip.		Simple e-beam pattern in this resist has been tested, the results showed on this page. If you have questions to the process or wish to use this e-beam resist, please contact [mailto:lithography@nanolab.dtu.dk lithography] at DTU Danchip.