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Specific Process Knowledge/Thermal Process/Furnace: Multipurpose annealing: Difference between revisions

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[[Category: Equipment |Thermal A2]]
[[Category: Equipment |Thermal A2]]
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The Multipurpose Annealing Furnace it made by ATV Technologie, and it was installed in the cleanroom in 2015.  
The Multipurpose Annealing Furnace it made by ATV Technologie, and it was installed in the cleanroom in 2015.  


The purpose of the Multipurpose Annealing Furnace is annealing and dry oxidation of different samples and resist pyrolysis. Annealling and resist pyrolysis can be done in vaccum or at atmospheric pressure, in a N<sub>2</sub> or H<sub>2</sub> atmosphere or a mixture of the two gasses.  
The purpose of the Multipurpose Annealing Furnace is annealing and dry oxidation of different samples and resist pyrolysis. Annealing and resist pyrolysis can be done in vacuum or at atmospheric pressure, in a N<sub>2</sub> or H<sub>2</sub> atmosphere or a mixture of the two gasses.  


All process gasses (except purge nitrogen) are heated, before they are introduced into the furnace at the door side.
All process gasses (except purge nitrogen) are heated, before they are introduced into the furnace at the door side.


Is is possible to change all quartz ware in the furnace (the furnace tube, the door sealing and the wafer boat). At the moment Danchip has two different sets of quartz ware:
Is is possible to change all quartz ware in the furnace (the furnace tube, the door sealing and the wafer boat). At the moment Nanolab has two different sets of quartz ware:


*Metal: Dedicated for different samples that cannot be RCA cleaned. Also samples with metals are allowed in the furnace, when this quartz set is mounted
*Metal: Dedicated for different samples that cannot be RCA cleaned. Also samples with metals are allowed in the furnace, when this quartz set is mounted
*Resist pyrolysis: Dedicated for resist pyrolysis.  
*Resist pyrolysis: Dedicated for resist pyrolysis.  


Please note that all new materials have to be approved by the Thin Film group (thinfilm@danchip.dtu.dk) before they are allowed in the furnace.  
Please note that all new materials have to be approved by the Thin Film group (thinfilm@nanolab.dtu.dk) before they are allowed in the furnace.  


The furnace tube is heated by use of 12 long heaters situated along the furnace tube and combined in three groups (top, bottom left and bottom right) and two flat heaters situated in the ends of the furnace tube. The this way the temperature will be very uniform everywhere in the furnace tube. The heating can be done very fast, up to 30 <sup>o</sup>C/min. For atmospheric pressure processes the maximum temperature is 1100 <sup>o</sup>C, and for vacuum processes the maximum temperature is 1050 <sup>o</sup>C.  
The furnace tube is heated by use of 12 long heaters situated along the furnace tube and combined in three groups (top, bottom left and bottom right) and two flat heaters situated in the ends of the furnace tube. The this way the temperature will be very uniform everywhere in the furnace tube. The heating can be done very fast, up to 30 <sup>o</sup>C/min. For atmospheric pressure processes the maximum temperature is 1100 <sup>o</sup>C, and for vacuum processes the maximum temperature is 1050 <sup>o</sup>C.