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Specific Process Knowledge/Lithography/DUVStepperLithography/Reticle Design: Difference between revisions

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Feedback to this page:'''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/DUVStepperLithography/Reticle_Design click here]'''  
Feedback to this page:'''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/DUVStepperLithography/Reticle_Design click here]'''  




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A guide for preparing reticle files for the Canon FPA-3000EX4 stepper, having the correct dimensions and positions of the individual patterns, frames and alignment marks can be found here: [[Media:Canon_Stepper_Reticle_Guide_v0_03.pdf]].  
A guide for preparing reticle files for the Canon FPA-3000EX4 stepper, having the correct dimensions and positions of the individual patterns, frames and alignment marks can be found here: [[Media:Canon_Stepper_Reticle_Guide_v0_03.pdf]].  


Usually the reticle is fabricated by an external company. It is recommended to send the mask design in GDS format to the Photolith group of Danchip, so that they can verify the mask design and order the mask.
Usually the reticle is fabricated by an external company. It is recommended to send the mask design in GDS format to the Photolith group of Nanolab, so that they can verify the mask design and order the mask.
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