Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
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== E-beam resists and Process flow == | == E-beam resists and Process flow == | ||
The table describes the e-beam resist used in the cleanroom for standard e-beam exposure. Some of resists are not provided by DTU | The table describes the e-beam resist used in the cleanroom for standard e-beam exposure. Some of resists are not provided by DTU Nanolab and some are not yet approved for common use in the cleanroom and are currently being tested. If you wish to test some of these resists or other resists, please contact [mailto:lithography@nanolab.dtu.dk Lithography]. | ||
Standard DTU | Standard DTU Nanolab resists purchased and tested by DTU Nanolab: | ||
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= Development = | = Development = | ||