Specific Process Knowledge/Lithography: Difference between revisions
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'''Feedback to this page''': '''[mailto:photolith@ | '''Feedback to this page''': '''[mailto:photolith@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography click here]''' | ||
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!Generel description | !Generel description | ||
|Pattern transfer via UltraViolet (UV) light | |Pattern transfer via UltraViolet (UV) light | ||
|Pattern transfer via | |Pattern transfer via Deep UltraViolet (DUV) light | ||
|Patterning by electron beam | |Patterning by electron beam | ||
|Pattern transfer via hot embossing (HE) | |Pattern transfer via hot embossing (HE) | ||
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*Any standard cleanroom material | *Any standard cleanroom material | ||
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*Any standard cleanroom material, except materials that will | *Any standard cleanroom material, except materials that will degas and special treatment for graphene | ||
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*Any standard cleanroom material | *Any standard cleanroom material | ||
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DTU | DTU Nanolab offers a Tool Package Training in Lithography; the course includes theory on lithographic processes and equipment, as well as training in equipment operation and processing in the cleanroom. | ||
The course is for all users that intend to perform any kind of lithographic processing in the cleanroom, and is a prerequisite for training in other lithography equipment. | The course is for all users that intend to perform any kind of lithographic processing in the cleanroom, and is a prerequisite for training in other lithography equipment. | ||
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!Qualified Prerequisites | !Qualified Prerequisites | ||
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* Cleanroom safety course at DTU | * Cleanroom safety course at DTU Nanolab | ||
* Admission to the cleanroom must be obtained before the training session | * Admission to the cleanroom must be obtained before the training session | ||
* Theoretical part must be completed before the training session | * Theoretical part must be completed before the training session | ||
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!Course Responsible | !Course Responsible | ||
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The Lithography Group at DTU Nanolab [mailto:lithography@ | The Lithography Group at DTU Nanolab [mailto:lithography@nanolab.dtu.dk lithography@nanolab.dtu.dk]. | ||
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* Describe fundamental parts of lithographic processing in a cleanroom, design of process flows | * Describe fundamental parts of lithographic processing in a cleanroom, design of process flows | ||
* Authorization to use spin coater, mask aligner, and developer at DTU | * Authorization to use spin coater, mask aligner, and developer at DTU Nanolab | ||
* Calculate relevant process parameters | * Calculate relevant process parameters | ||
* Analyze and apply your results of lithographic processing | * Analyze and apply your results of lithographic processing | ||