Specific Process Knowledge/Characterization/XPS

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XPS-ThermoScientific

The XPS system placed at DTU Nanolab (room 904, building 346).

In the basement under the cleanroom an X-ray Photoelectron Spectroscopy (XPS) system is installed in room 904. It is a K-Alpha system by ThermoScientific that enables the users to perform elemental and chemical analysis of samples.

The user manual(s), user APV(s), technical information and contact information are be found in LabManager:

XPS-ThermoScientific in LabManager

Elemental analysis

The XPS instrument enables elemental analysis, chemical state analysis on the sample surface or deeper down by a depth profiling. A comparison about techniques and instruments used for elemental analysis at DTU Nanolab can be found on the page Element analysis.

More about the different possibilities of the XPS instrument is found here:

• The XPS technique
• Elemental analysis
• Chemical sensitivity
• Depth profiling
• Carbon contamination

• Links to external material

Getting access to the XPS

Click HERE to see information on how to get access to the XPS.

Analyzing XPS spectra

The analysis of XPS spectra is an art in itself. Click on the link below to find a some examples in which the Avantage software package has been used to extract information from experiments.

• Processing XPS data

Equipment performance of XPS-ThermoScientific

Purpose	Chemical analysis	Probing elemental composition Chemical state identification Non destructive technique Surface sensitive Depth profiling possible by ion beam etch of sample
Performance	Spot size	Can be set between 30µm - 400µm
	Probing depth	Depending on probed element. Max probe depth lies within 10-200 Å.
	Resolution	Dependent on probed elements. Concentrations down to about 0,5 atomic % can in some cases be detected.
	Charge compensation	Flood gun can be used for charge compensation of non conductive samples
	Finding structures	Choose measuring spot from camera image (magnified)
Depth profiling	Purpose	With ion beam etch the top layer of the material can be removed, to do a depth profiling
	Ion beam size	About 3x1 mm
Substrates	Substrate size	Maximum 60x60 mm
	Substrate thickness	Maximum height about 20 mm