Specific Process Knowledge/Wafer cleaning/RCA: Difference between revisions
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'''Feedback to this page''': '''[mailto:wetchemistry@ | '''Feedback to this page''': '''[mailto:wetchemistry@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Wafer_cleaning/RCA click here]''' | ||
==RCA cleaning== | ==RCA cleaning== | ||
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*Optional: HF: 30 sec (avoid it if you have a very thin oxide (0-200 Å) as the top layer) | *Optional: HF: 30 sec (avoid it if you have a very thin oxide (0-200 Å) as the top layer) | ||
*DI water rinsing (bubbler)<br> | *DI water rinsing (bubbler)<br> | ||
For procedure details please look in the [http://labmanager | For procedure details please look in the [http://labmanager.dtu.dk/d4Show.php?id=1633&mach=243 user manual] in LabManager. | ||
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'''The user manual, user APV and contact information can be found in LabManager:''' | '''The user manual, user APV and contact information can be found in LabManager:''' | ||
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[http://labmanager | [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=243 RCA info page in LabManager] | ||
==Overview of RCA process data== | ==Overview of RCA process data== | ||
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4"-6" wafers <br /> | 4"-6" wafers <br /> | ||
For 2" wafers please contact | For 2" wafers please contact Nanolab staff | ||
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4"-6" wafers <br /> | 4"-6" wafers <br /> | ||
For 2" wafers please contact | For 2" wafers please contact Nanolab staff | ||
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4"-6" wafers <br /> | 4"-6" wafers <br /> | ||
For 2" wafers please contact | For 2" wafers please contact Nanolab staff | ||
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