Specific Process Knowledge/Wafer cleaning/IMEC: Difference between revisions
| Line 60: | Line 60: | ||
Temp: 25<sup>o</sup>C<br> | Temp: 25<sup>o</sup>C<br> | ||
Time: 100 sec | Time: 100 sec | ||
|<b>Make an appointment some days in advance with a | |<b>Make an appointment some days in advance with a Nanolab employee to help you with this step!</b> | ||
*Clean tank (Cleanroom D-3, the 'Optional Bath' inside Wet Bench 05: Al etch) | *Clean tank (Cleanroom D-3, the 'Optional Bath' inside Wet Bench 05: Al etch) | ||
*Mix your IMEC solution in dedicated bottle (IMEC) inside a fume hood | *Mix your IMEC solution in dedicated bottle (IMEC) inside a fume hood | ||