Jump to content

Specific Process Knowledge/Wafer cleaning/IMEC: Difference between revisions

Jmli (talk | contribs)
Jmli (talk | contribs)
Line 63: Line 63:
*Clean tank (Cleanroom D-3, the 'Optional Bath' inside Wet Bench 05: Al etch)
*Clean tank (Cleanroom D-3, the 'Optional Bath' inside Wet Bench 05: Al etch)
*Mix your IMEC solution in dedicated bottle (IMEC) inside a fume hood
*Mix your IMEC solution in dedicated bottle (IMEC) inside a fume hood
*Ask a Danchip employee to help you filling the solution into the 'Optional Bath' tank!  
*Ask a Nanolab employee to help you filling the solution into the 'Optional Bath' tank!  
|
|
.
.