Specific Process Knowledge/Lithography/Descum: Difference between revisions
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==Plasma asher 2 == | |||
Descum of AZ Mir 701 resist on 100mm silicon wafer. Five wafers were placed vertically in chamber. | Descum of AZ Mir 701 resist on 100mm silicon wafer. Five wafers were placed vertically in chamber. | ||
Experiment parameters | <div style='text-align: left;'>Experiment parameters</div> | ||
{| {{table}} | {| {{table}} | ||
| align="center" | | | align="center" | | ||
{| border="1" cellspacing="1" cellpadding="2" align="center" | {| border="1" cellspacing="1" cellpadding="2" align="center" | ||
|- style="background:LightGrey" | |- style="background:LightGrey" | ||