Specific Process Knowledge/Lithography/Descum: Difference between revisions

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Descum of AZ5214E resist on 50mm silicon wafer. Wafer was placed horisontally in chamber on a 100 mm carier wafer.

Note: Plasma asher was cold before use

Conny Hjort & Jesper Hanberg September 2019

Revision as of 14:26, 19 November 2019 view source Jiurban (talk \| contribs) NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231 54 edits →‎Descum results ← Older edit		Revision as of 14:26, 19 November 2019 view source Jiurban (talk \| contribs) NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231 54 edits →‎Plasma asher 2 Newer edit →
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	===Plasma asher 2 ===		===Plasma asher 2 ===

	[[File:graf_descum.png\|~~200px~~\|right\|frame\| Descum results]]		[[File:graf_descum.png\|100px\|right\|frame\| Descum results]]