Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions
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During exposure of a stripe the stage moves at a constant speed. Each stripe thus includes a certain movement overhead for acceleration and deceleration. As the stripes get shorter, this overhead becomes more significant, and the normal writing speed is no longer achieved. For samples smaller than a 2" wafer, the writing speed of Aligner: Maskless 02 drops below the specified 285mm<sup>2</sup>/min. | During exposure of a stripe the stage moves at a constant speed. Each stripe thus includes a certain movement overhead for acceleration and deceleration. As the stripes get shorter, this overhead becomes more significant, and the normal writing speed is no longer achieved. For samples smaller than a 2" wafer, the writing speed of Aligner: Maskless 02 drops below the specified 285mm<sup>2</sup>/min. | ||
When the exposure is started on the maskless aligner, the software starts converting the design to the data needed for the exposure. When sufficient data has been generated, the hardware starts exposing the sample while more data is being generated. This simultaneous data conversion and exposure is called Online conversion. Once a design has been converted (exposed) | When the exposure is started on the maskless aligner, the software starts converting the design to the data needed for the exposure. When sufficient data has been generated, the hardware starts exposing the sample while more data is being generated. This simultaneous data conversion and exposure is called Online conversion. Once a design has been converted (exposed) the data may be reused for repeated exposures (Offline conversion). Due to no time lost waiting for data, offline exposure may be several tens of % faster than online. However, the converted data can only be reused if no alignment is needed, including flat alignment ("Expose with substrate angle"). | ||
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