Specific Process Knowledge/Lithography/Descum: Difference between revisions
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==Descum results== | ==Descum results== | ||
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Conny Hjort & Jesper Hanberg | |||
September 2019 | |||
Revision as of 15:41, 21 October 2019
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Descum results
Plasma asher 1
Descum of AZ5214E resist on 50mm silicon wafer. Wafer was placed horisontally in chamber on a 100 mm carier wafer.
Note: Plasma asher was cold before use
Conny Hjort & Jesper Hanberg September 2019 |
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