Specific Process Knowledge/Thermal Process/Oxidation/Standard oxidation recipes: Difference between revisions
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'''07 ANNEAL''' | '''07 ANNEAL''' | ||
''Message: " | ''Message: "Anneal/Dens"'' | ||
The O<sub>2</sub> gas is purged out of the furnace by an N<sub>2</sub> flow, so that the oxidation stop. | The O<sub>2</sub> gas is purged out of the furnace by an N<sub>2</sub> flow, so that the oxidation stop. | ||
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Normally the annealing time is 20 minutes, but it is a variable command, so it can be set by the user. | Normally the annealing time is 20 minutes, but it is a variable command, so it can be set by the user. | ||
The annealing time can be changed, until the annealing step is started. | |||
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When the wafers are unloaded, the user has to press "Start" (on the touch screen) or "Continue" (on the furnace computer) to close the furnace. | When the wafers are unloaded, the user has to press "Start" (on the touch screen) or "Continue" (on the furnace computer) to close the furnace. | ||
The recipe then jumps to the STANDBY step, and the user can leave the furnace, after it has closed | The recipe then jumps to the STANDBY step, and the user can leave the furnace, after it has closed. | ||