Specific Process Knowledge/Lithography/EBeamLithography/FilePreparation: Difference between revisions
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HSWITCH: | '''HSWITCH''': | ||
HSWITCH ON,OFF: machine focusses beam to the Height average between P and Q marks | HSWITCH ON,OFF: machine focusses beam to the Height average between '''P and Q marks''' | ||
HSWITCH OFF,ON: machine focusses beam to the height average of chip marks | HSWITCH OFF,ON: machine focusses beam to the height average of '''chip marks''' | ||
HSWITCH ON,ON: machine focusses beam to the height average of chip marks. The chip mark height will overrule the P and Q mark height during exposure. | HSWITCH ON,ON: machine focusses beam to the height average of chip marks. The chip mark height will overrule the P and Q mark height during exposure. | ||