Specific Process Knowledge/Lithography/Descum: Difference between revisions

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===Plasma asher 1 ===
===Plasma asher 1 ===


{| class="wikitable"
{| {{table}}
! !! !!  | colspan="6"|   ashing time (min) !! 
| align="center" |
{| border="1" cellspacing="1" cellpadding="2"  align="center"
! colspan="4" | Settings
! colspan="6" | Etched Thickness (nm)  
|-
|-
| ||  ||  ||  || 1 || 2 || 5 || 7 || 10 || 10
| colspan="4" |
|-
! colspan="6" | ashing time (min)  
| Recipe || O2 flow || N2 flow || Power || Etched Thickness (nm) || || || |||  
|- style="background:LightGrey"
|| Recipe || O2 flow || N2 flow || Power  
| 1 || 2 || 5 || 7 || 10 || 10
|-
|-
| 1 || 70 || 70 || 150 || 14,2 || 16,3 || 47,6 || 123,2 || 854,3 || 862,1
| 1 || 70 || 70 || 150 || 14,2 || 16,3 || 47,6 || 123,2 || 854,3 || 862,1
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| 2 || 500 || 0 || 200 ||  || 8,1 || 32,9 || 271,1 || 495,6 || 446,2
| 2 || 500 || 0 || 200 ||  || 8,1 || 32,9 || 271,1 || 495,6 || 446,2
|-
|-
|
|}
|}

Revision as of 11:15, 30 August 2019

Descum results

Plasma asher 1

Settings Etched Thickness (nm)
ashing time (min)
Recipe O2 flow N2 flow Power 1 2 5 7 10 10
1 70 70 150 14,2 16,3 47,6 123,2 854,3 862,1
2 500 0 200 8,1 32,9 271,1 495,6 446,2