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==Aluminium deposition on AZ5214 for lift-off==
==Aluminium deposition on AZ5214 for lift-off==
Use a negative photolithographi process for best result.
The more patern the easyer lift.
It was tried(jan09) to lift 2,5µ Al on 4,2µ negative resist on top of 11µ Apox SiO2 in acetone sonic-bath.
This proces was done by steps evaporating only 5000Å a time with 5min pause and pressure down to at least 2E-6.