Specific Process Knowledge/Lithography/Strip: Difference between revisions
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==Plasma asher== | ==Plasma asher== | ||
[[Image:plasmaasher2.JPG|300x300px|thumb|The Plasma | [[Image:plasmaasher2.JPG|300x300px|thumb|The Plasma Asher 1 is placed in C-1]] | ||
'''Feedback to this section''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Strip#Plasma_asher click here]''' | '''Feedback to this section''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Strip#Plasma_asher click here]''' | ||
The Plasma | The Plasma Asher 1 (TePla 300 auto load model) can be used for the following process: | ||
*Photoresist stripping | *Photoresist stripping | ||
*Descumming | |||
*Surface cleaning after storage | *Surface cleaning after storage | ||
*Surface cleaning after processes using oil pump or diffusion pump vacuum | *Surface cleaning after processes using oil pump or diffusion pump vacuum | ||